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Laser Induced Deposition of Aluminum from the Vapor Phase

IP.com Disclosure Number: IPCOM000122338D
Original Publication Date: 1991-Nov-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 1 page(s) / 67K

Publishing Venue

IBM

Related People

Baum, TH: AUTHOR [+3]

Abstract

The laser-induced deposition of high purity aluminum is achieved by the pyrolytic decomposition of the aluminum hydride-trimethylamine complex. The nonpyrophoricity and substantial vapor pressure of this aluminum precursor makes it ideal for the rapid deposition of pure aluminum metal. This is a vast improvement over other aluminum alkyl complexes which are either relatively nonvolatile (i.e., triisobutyl aluminum) or decompose to carbon contaminated aluminum films (i.e., trimethyl aluminum).

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Laser Induced Deposition of Aluminum from the Vapor Phase

      The laser-induced deposition of high purity aluminum is
achieved by the pyrolytic decomposition of the aluminum
hydride-trimethylamine complex.  The nonpyrophoricity and substantial
vapor pressure of this aluminum precursor makes it ideal for the
rapid deposition of pure aluminum metal. This is a vast improvement
over other aluminum alkyl complexes which are either relatively
nonvolatile (i.e., triisobutyl aluminum) or decompose to carbon
contaminated aluminum films (i.e., trimethyl aluminum).

      In the process described here, several sources of radiation may
be utilized with wavelengths ranging from the visible to the far
ultraviolet (UV).  The preferred mode of decomposition is thermal in
nature, but several variations of the process could be utilized to
produce films of aluminum.  For example, high power UV radiation may
be used to decompose the aluminum precursor in a "hybrid" deposition,
whereby both thermal and photochemical effects are important.  Also,
the substrate where deposition is to occur may be heated by
conventional techniques before, during, and/or after the initial
deposition of aluminum is induced by the laser radiation.  Thus, the
selectivity of the deposited aluminum film is defined by the laser
radiation through either a focused and/or patterned image.

      Aluminum hydride-amine complexes can be tailored by the choice
of alkyl substituents on the amine ligand (i.e.,...