Browse Prior Art Database

Micromachine Transfer Belt Data Tape Process

IP.com Disclosure Number: IPCOM000122585D
Original Publication Date: 1991-Dec-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 2 page(s) / 54K

Publishing Venue

IBM

Related People

Cronin, JE: AUTHOR [+2]

Abstract

A thin tape, having holes created at predetermined locations along its length for permanent data storage or other purposes, is formed in a plane normal to a substrate using semiconductor processing technology.

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This is the abbreviated version, containing approximately 78% of the total text.

Micromachine Transfer Belt Data Tape Process

      A thin tape, having holes created at predetermined
locations along its length for permanent data storage or other
purposes, is formed in a plane normal to a substrate using
semiconductor processing technology.

      Referring to Fig. 1, photoresist (PR) 12, silicon dioxide
(oxide) 14, and PR 16 are deposited conformally on substrate 10.  An
edge is formed in PR 16 by photo processing to leave projections,
e.g., 18 and 20, in positions where holes are desired along length L.
Reactive ion etching (RIE) is used to remove unprotected oxide 14,
stopping on PR 12.  Then, remaining PR 16 is removed by RIE. Exposed
PR 12 is partially etched away during this removal of PR 16.

      Next, referring to Fig. 2, PR layer 22 is applied which is much
thicker than PR 12.  PR 22 is imaged to form a simple straight edge
and developed.  RIE and isotropic ashing are performed to remove some
of PR 22, all of PR 12 unprotected by oxide 14, plus some PR 12
from under edges of oxide 14, leaving tabs of oxide 14 protruding as
shown.

      Referring to Fig. 3, parylene is conformally deposited and
anisotropically etched by RIE to leave a sidewall coating 24.  Oxide
protrusions are free of coating 24 on their top surface and sides.  A
series of isotropic processes is used to remove all oxide and PR,
leaving only the vertical tape 24 of parylene and small projections
below openings in the tape.  These projections may be remov...