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Browse Prior Art Database

Particle Free Rotary Introduction Means

IP.com Disclosure Number: IPCOM000122680D
Original Publication Date: 1991-Dec-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 2 page(s) / 67K

Publishing Venue

IBM

Related People

Vollmer, S: AUTHOR

Abstract

The article describes a rotary introduction means which is used in wet chemical process systems or centrifuges to clean and dry silicon wafers.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 68% of the total text.

Particle Free Rotary Introduction Means

      The article describes a rotary introduction means which
is used in wet chemical process systems or centrifuges to clean and
dry silicon wafers.

      Such equipment comprises a rotary table in a process chamber,
on which the product rotates at speeds ranging from 10 to 1000 rpm,
depending upon the respective processing step.  For cleaning or
drying the process chamber, ultrapure (DI) water or nitrogen is led
via a duct system and nozzles through a rotary table shaft.  A
single-duct rotary introduction means is used to transfer the media
to the rotating shaft.  The introduction means is fitted with sliding
or roller bearings, as well as sealings.  These components frequently
emit particles in sizes ranging from 0.1 to 3.0 mm, rendering the
sealings ineffective after a short time and leading to corrosion at
those points.  The biggest problem arises at the end of the
processing cycle when the process chamber and the product are dried.
For that purpose, nitrogen is blown through the rotary introduction
means at high pressure and a speed of up to 1000 rpm.  Particles
existing or occurring in the introduction means are blown via the
shaft, the rotary table and the nozzles into the process chamber,
settling on the product.  In critical processes, this leads to
inferior quality or products having to be scrapped or reworked.

      The means described and illustrated in this article is designed
such that the media (ul...