Browse Prior Art Database

Silicon Ink Jet Nozzle Plate

IP.com Disclosure Number: IPCOM000122926D
Original Publication Date: 1998-Jan-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Greschner, J: AUTHOR [+3]

Abstract

Disclosed is a nozzle plate to be used in ink jet print heads. Ink jet nozzle plates define the quality of an ink jet print head. Small bore diameters, concentricity and small hole to hole distance are the major requirements of today's and future print heads.

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Silicon Ink Jet Nozzle Plate

      Disclosed is a nozzle plate to be used in ink jet print
heads.  Ink jet nozzle plates define the quality of an ink jet print
head.  Small bore diameters, concentricity and small hole to hole
distance are the major requirements of today's and future print
heads.

      The proposed nozzle plate fulfills all of the three
requirements.  The base material is a silicon wafer around 200
microns thick.  The nozzle pattern is defined lithographically from
the backside and from the frontside simultaneously.  The nozzles are
then created by two different etching processes:  a precise deep
anisotropic plasma frontside etching and an anisotropic wet etching
or dry etching  from the backside.  This process sequence allows to
maintain a high precision of the critical nozzle diameter and shape
in a nozzle plate which can be much thicker than the nozzle length.

      Another advantage is the application of a plasma polymer onto
the front side prior to the lithographic patterning.  This polymer
layer later acts as a non-wetting layer around the orifice of the
nozzle. A  regular photoresist can be used to pattern the plasma
polymer layer and the deep dry etching of the frontside part of the
nozzle.  The photoresist can be removed after all etching steps
without removal of the plasma polymer.

      The Figure shows a schematic drawing of the nozzle plate, with
the polymer non-wetting layer on top of the frontside, the critical
bo...