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Improved Oven for Vapor Lubrication

IP.com Disclosure Number: IPCOM000122937D
Original Publication Date: 1998-Jan-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 2 page(s) / 63K

Publishing Venue

IBM

Related People

Coffey, KR: AUTHOR [+3]

Abstract

Thin film disks may be uniformly coated with a near monolayer surface coverage of the perflouropolyether lubricant having reactive end groups (such as Fomblin Zdol or similar) by heating the disks and the lubricant together in a closed atmosphere oven. To prevent an uncontrolled thick coating of lubricant, it is necessary for the partial pressure of the lubricant at the disk surface to always be less than the equilibrium partial pressure for condensation of liquid lubricant (Po). It is also desired for the lubricant partial pressure to be as high as possible during the coating process to allow a high concentration in the carrier gas (air, nitrogen, or other inert gas) for rapid transport of the lubricant to the disk surfaces to quickly establish the uniform absorbed thickness.

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Improved Oven for Vapor Lubrication

      Thin film disks may be uniformly coated with a near monolayer
surface coverage of the perflouropolyether lubricant having reactive
end groups (such as Fomblin Zdol or similar) by heating the disks and
the lubricant together in a closed atmosphere oven.  To prevent an
uncontrolled thick coating of lubricant, it is necessary for the
partial pressure of the lubricant at the disk surface to always be
less than the equilibrium partial pressure for condensation of liquid
lubricant (Po).  It is also desired for the lubricant partial
pressure to be as high as possible during the coating process to
allow a high concentration  in the carrier gas (air, nitrogen, or
other inert gas) for rapid transport of the lubricant to the disk
surfaces to quickly establish the  uniform absorbed thickness.  Thus,
it is desired to control the lubricant  partial pressure to be as
high as possible, but less than Po.  This goal  can be readily
achieved by modifications of the standard closed atmosphere oven
(which heats the disks and lubricant together) to allow  separate
control of disk surface temperature, lubricant reservoir
(evaporation source) temperature, and/or lubricant partial pressure
within the oven.  Such modifications also allow for variation during
the coating for an optimal process.

      In the first example of a modified closed atmosphere oven, the
lubricant reservoir has a separate heating and/or cooling elements
and a temperature control, so that the disk surface temperature and
the lubricant reservoir temperature may be separately controlled.

      In the second...