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An Exposure Method of Photo Mask for Zigzag Stitching and Gradation Stitching of Active Matrix Liquid Crystal Display

IP.com Disclosure Number: IPCOM000123189D
Original Publication Date: 1998-Jun-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 2 page(s) / 97K

Publishing Venue

IBM

Related People

Atsumi, M: AUTHOR

Abstract

Disclosed is a technique to achieve Active Matrix Liquid Crystal Display's (AM-LCD's) high display image quality by introducing new exposure method which makes sizes of patterns on a photo mask for zigzag stitching and gradation stitching more precise.

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An Exposure Method of Photo Mask for Zigzag Stitching and Gradation
Stitching of Active Matrix Liquid Crystal Display

   Disclosed is a technique to achieve Active Matrix Liquid
Crystal Display's (AM-LCD's) high display image quality by
introducing new exposure method which makes sizes of patterns on a
photo mask for zigzag stitching and gradation stitching more
precise.

   Fig. 1 shows an example of required patterns on a photo
mask for gradation stitching.  Generally a photo mask is exposed by
one path of scanning at its photo process.  When a mask exposed by
laser beam, because of the laser characteristics, line widths in
zigzag area or gradation area on the mask differ from those in inner
pixel area on the dependence of pattern density.  If the masks that
have incorrect sizes of patterns in zigzag or gradation stitching
area on them are applied to expose at AM-LCD's photo process, the
stitching area is exposed imperfectly and its stitching boundaries
can be seen easily by users.

   With this method, a photo mask is exposed by two or
several paths of laser scanning at its photo process.  Figs. 2 and 3
show an example combination of exposing patterns when negative resist
is used with this method.  Fig. 2 shows one of these drawings, which
should consists of pixel patterns repeating the same shapes
continuously to stabilize the intensity of laser beam at pixel
patterns' exposure, and Fig.3 shows another drawing, which consists
of gradation mask.  In this case, t...