Browse Prior Art Database

Partial Etch or Channel Forming to Protect Trace and Reduce the Height

IP.com Disclosure Number: IPCOM000123652D
Original Publication Date: 1999-Feb-01
Included in the Prior Art Database: 2005-Apr-05
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Le, HH: AUTHOR [+2]

Abstract

Abstract: The current flexure design for ILS suspensions contains 3 different layers: stainless steel, polymer, and copper traces. With this design, the profile height of traces may limit the space between the disks and cause a lot of problems. Therefore, the partial etch or channel forming on the flexure can reduce the height of traces which will help to protect all the traces.

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Partial Etch or Channel Forming to Protect Trace and Reduce the Height

   Abstract:

   The current flexure design for ILS suspensions contains 3
different layers: stainless steel, polymer, and copper traces. With
this design, the profile height of traces may limit the space between
the disks and cause a lot of problems.  Therefore, the partial etch
or channel forming on the flexure can reduce the height of traces
which will help to protect all the traces.

   Description:

   Referring to the drawing 1, the current flexure design is
comprised of 3 different layers: stainless steel 4, polymide 5, and
copper traces 6.  The first proposal is shown in drawing 2.  The
stainless steel 4 is partially etched on one side to reduce the
thickness.  Then polymide 5 and copper traces 6 layers are placed on
the etched area of the stainless steel layer 4.  So the height of
traces can be reduced.  The second approach is shown in drawing 3.
The stainless steel 4 is a formed channel on the edge which can
protect all the traces.

   With these two approaches, the height of traces can be
reduced and traces can be protected from damage during assembly
process or shock.