Browse Prior Art Database

Cleanable Metal Gas Trap

IP.com Disclosure Number: IPCOM000124028D
Original Publication Date: 1991-Feb-01
Included in the Prior Art Database: 2005-Apr-06
Document File: 1 page(s) / 38K

Publishing Venue

IBM

Related People

Buchspics, LC: AUTHOR [+2]

Abstract

By means of this new design for metal gas traps at input and output sides of an ion charge exchange enclosure, more efficient gas trapping and heating are realized. Overall cost of operation and maintenance of the charge exchange unit is reduced by this type of gas trap.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

Cleanable Metal Gas Trap

      By means of this new design for metal gas traps at input and
output sides of an ion charge exchange enclosure, more efficient gas
trapping and heating are realized.  Overall cost of operation and
maintenance of the charge exchange unit is reduced by this type of
gas trap.

      The figure shows a charge exchange unit which is installed in
an ion beam unit, e.g. an implanter.  When the ion beam system is
evacuated and ready for use, heat is applied to standard enclosure 2
which contains a metal 4, e.g., magnesium (Mg).  Metal 4 is sublimed
to provide a charge exchange gas.  Gas traps 6 and 8 are of the new
design which more efficiently traps metal gas, provides ease of
cleaning of traps, and reduces necessary cleaning of the ion beam
system.

      Traps 6 and 8 are of the same basic design but may be sized
differently if appropriate to system dimensions or other
requirements.  Thin stainless steel liner 10 is removable for
cleaning but fits tightly against the external wall of enclosure 2 to
prevent leakage of metal gas to the system.  Containment housing 12
slides over liner 10 and retains removable graphite aperture plate
14.  Plate 14 is eroded in the vicinity of input positive ion beam 16
and output negative ion beam 18 with use but is easily replaced when
necessary.

      Disclosed anonymously.