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Method for improving the laser-produced plasma source used in EUVL

IP.com Disclosure Number: IPCOM000124067D
Publication Date: 2005-Apr-07
Document File: 2 page(s) / 46K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for improving the laser-produced plasma (LPP) source used in extreme ultraviolet lithography (EUVL). Benefits include improved functionality and improved performance.

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Method for improving the laser-produced plasma source used in EUVL

Disclosed is a method for improving the laser-produced plasma (LPP) source used in extreme ultraviolet lithography (EUVL). Benefits include improved functionality and improved performance.

Background

      No conventional solution exists for improving the LPP source used in EUVL.

Description

              The disclosed method is an improved LPP source for EUVL to meet high volume manufacturing requirements. One implementation ejects liquid droplets from multiple orifices (rather than a single orifice or nozzle). The jets are closely placed (as close as 50 μm) and combined with appropriate collection optics. The multiple orifices eject up to 5-million liquid droplets per second each. The droplets are as small as 3-μm diameter. A scanning mirror can be used to deflect the incoming laser beam to each of the different jets (see Figure 1).

      An alternate implementation delivers dry powder material (instead of delivering liquid droplets), such as Sn, Cu, Pb powders in the range of 5-20 μm in diameter. The stable dry-powder jet enables the laser to hit the target consistently.

      Experimentation indicates that having closely spaced multiple jets provide better results than having a single jet. More laser-produced plasma in a small volume generates a much higher power output for the EUV source.

              The key elements of the disclosed method include:

•             Fluid ejector

•             E...