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Method for a triple-filter application for a sulfuric wet cleaning process tool

IP.com Disclosure Number: IPCOM000127908D
Publication Date: 2005-Sep-14
Document File: 2 page(s) / 59K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a triple-filter application for a sulfuric wet cleaning process tool. Benefits include improved functionality and improved performance.

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Method for a triple-filter application for a sulfuric wet cleaning process tool

Disclosed is a method for a triple-filter application for a sulfuric wet cleaning process tool. Benefits include improved functionality and improved performance.

Background

              With the introduction of the 130-nm process, defect levels found on the sulfuric cleaning semiconductor process tool could no longer be lowered using conventional methods. They include using filters with reduced pore size and increasing the frequency of preventative maintenance activities. At .13-micron geometries, the particles added by the chemical cleaning process result in yield and reliability degradation.

              Conventionally, smaller pore-size filters remove smaller defects. However, a higher pressure drop occurs across the filters and less turnover occurs in the recirculated bath. As a result, the reduced velocity across the wafer surface is less effective at removing particles from the wafer.

              To use a smaller pore-size filter while maintaining a high liquid velocity across the wafer face, more filter media is required in a parallel-filter configuration.

              The conventional process of record (POR) sulfuric wet cleaning process tool has two parallel filters (see Figure 1).

Description

              The disclosed method is a modification to a sulfuric wet-cleaning process tool that adds a third parallel filter to the sulfuric recirculation stream. This modification increases the filter media by 50% and enables the use of smaller pore-size filters while maintaining a high velocity across the wafer face in the bath.

              The...