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Method of Demagnifying Features on a Lithographic Master Pattern by Stretching or Shrinking a Substrate

IP.com Disclosure Number: IPCOM000131035D
Publication Date: 2005-Nov-04
Document File: 2 page(s) / 80K

Publishing Venue

The IP.com Prior Art Database

Abstract

Method of Demagnifying Features on a Lithographic Master Pattern by Stretching or Shrinking a Substrate.

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  Method of Demagnifying Features on a Lithographic Master Pattern by Stretching or Shrinking a Substrate

  This is a new method that can produce dense patterns of sub-100 nm feature size by elastic shrinking of the topographic pattern on the stretched polymeric membrane. This method is suitable for applications in magnetically recorded patterned media. An elastic polymeric membrane, with uniform elastic properties over a large area, is stretched in a uniform manner by at least a factor of 2X in two dimensions. A resist pattern is created on top of the stretched membrane by e-beam lithography, optical lithography or imprint lithography and transferred into polymer, for example by dry etching techniques. After etch, the membrane is allowed to relax in a uniform manner, resulting in a demagnification of the features initially created by conventional techniques. This pattern can be transferred to a rigid substrate by imprinting, or it can be used as a template to produce imprinting stamps. Due to the elastic relaxation of the membrane, the relaxed membrane may contain three-dimensional features that protrude upwards from the original surface of the membrane.

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Disclosed by Hitachi Corporation

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