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Improved method to reduce small voids in crystals

IP.com Disclosure Number: IPCOM000131036D
Publication Date: 2005-Nov-04
Document File: 4 page(s) / 1M

Publishing Venue

The IP.com Prior Art Database

Related Documents

IPCOM000059477D: IP.COM

Abstract

The invention relates to an improved method for minimizing the amount of entrapped gas such as Ar in bubbles / voids in poly-silicon nuggets or granules.

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