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Method for a lithographic pattern using improved OPC

IP.com Disclosure Number: IPCOM000132109D
Publication Date: 2005-Dec-01
Document File: 3 page(s) / 31K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a lithographic pattern using improved optical proximity correction (OPC). Benefits include improved functionality and improved performance.

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Method for a lithographic pattern using improved OPC

Disclosed is a method for a lithographic pattern using improved optical proximity correction (OPC). Benefits include improved functionality and improved performance.

Background

      Optical proximity correction (OPC) engines function by optimizing the edges in a layout so the simulated contour matches the user-specified target contour. The robustness and efficiency of OPC is directly affected by the characteristics of the target contour and the detail in its definition. The target contour is defined in a correction set (recipe) using mathematical curves. Conventional methods utilize a large number of simple geometric curves, each with fixed parameters. Using simple curves can be error prone.

              Conventional OPC uses a variety of simple geometric curves, such as elliptical or power curves to define target correction contours. Many different types of curves must be used to capture the minimum-required variety of target contours. Each of these curves have fixed parameters, such as the radius and require many separate instances of curves to describe a complete contour. As a result, the conventional solution can be inefficient and inaccurate.

General description

      The disclosed method is a lithographic pattern using more accurate OPC by ensuring convergence to a design target.

              The key elements of the disclosed method include:

•             Realistic target instead of a geometric pattern

•             Generalized curve that is able to replicate the functionality of many simple geometric curves with a single representation

•             Curve parameters with dependencies on the layout geometry

Advantages

              The disclosed method provides advantages, including:
•             Improved functionality due to replicating and extending the functionality of many simple geometric curves with a single representation

•             Improved functionality due to providing a single rule that defines a family of curves by enabling curve parameters to have dependencies on the layout geometry
•             Improved performance due to reducing the complexity of OPC recipes and increasing convergence to a pattern by process variation

Detailed descriptio...