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Method for patterning polymer-silicon on 3-D structures

IP.com Disclosure Number: IPCOM000132110D
Publication Date: 2005-Dec-01
Document File: 3 page(s) / 47K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for patterning polymer-silicon on three-dimensional (3-D) structures. Benefits include improved functionality, improved performance, and improved reliability.

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Method for patterning polymer-silicon on 3-D structures

Disclosed is a method for patterning polymer-silicon on three-dimensional (3-D) structures. Benefits include improved functionality, improved performance, and improved reliability.

Background

              In trigate transistors; polymer is conventionally deposited over previously patterned fin structures. A hardmask is deposited over a polymer layer that is not flat. Resist material is deposited over a hardmask that has a topographical variation more than 650A. The hardmask and polymer are subsequently etched.

              Polymer patterning over 3-D structures is performed conventionally. However, large L_g variations degrade performance significantly. A solution is required that eliminates the L_g variations (see Figure 1).

              The conventional solution can be implemented using the following steps:

1.           Deposit polymer over previously patterned fin structures (see Figure 2). 

2.           Deposit a hardmask over polymer that is not flat.

3.           Perform hard-mask lithography to pattern the trigate polymer.

4.           Etch the polymer hardmask (see Figure 3).

5.           Remove the resist material.

6.           Etch the polymer.

Description

              The disclosed method creates vertical polymer profiles over large topographical variations where critical dimension variations are negligible.

              The key elements of the disclosed method include:

•             Polishing the polymer deposited over patterned structures to improve the lithographic printing capabilities

•             Patterning a hardmask cleanly over the polymer

•            ...