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Method for patterning nanoparticles using a Faraday-cage-like mask

IP.com Disclosure Number: IPCOM000132114D
Publication Date: 2005-Dec-01
Document File: 2 page(s) / 91K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for patterning nanoparticles using a Faraday-cage-like mask. Benefits include improved functionality.

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Method for patterning nanoparticles using a Faraday-cage-like mask

Disclosed is a method for patterning nanoparticles using a Faraday-cage-like mask. Benefits include improved functionality.

Background

              Conventionally, nanoparticles are deposited primarily from a vapor phase in downstream plasma reactors.

Description

              The disclosed method includes patterned deposition and post-deposition patterning of nanoparticles on a substrate for use in nanoparticle electrical and/or photonic devices.

      The disclosed method can be implemented using the following steps (see Figure 1):

1.   Deposit a bottom contact for a nanoparticle device on a handle wafer.

2.   Pattern an insulating mask.

3.   Pattern a metal mask aligned to an insulating mask (may be combined with step 2).

4.   Connect the metal mask to ground and bias the bottom contact.

5.   Place the device in a plasma.

      The unmasked biased region selectively attracts nanoparticles from the vapor.

      Alternatively, a grounded metallic shadow mask may be used in place of the masks described in steps 2 and 3. The metallic shadow mask has the advantage of being reusable.

      The grounded metallic mask and the shadow mask act as shields so the nanoparticles are selectively attracted to the unmasked regions.

Advantages

              The disclosed method provides advantages, including:
•             Improved functionality due to providing nanoparticle patterning on a substrate
•...