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Method for a self-evacuating head weight for CMP tool sets

IP.com Disclosure Number: IPCOM000132320D
Publication Date: 2005-Dec-07
Document File: 2 page(s) / 38K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a self-evacuating head weight for CMP tool sets. Benefits include improved functionality and improved reliability.

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Method for a self-evacuating head weight for CMP tool sets

Disclosed is a method for a self-evacuating head weight for CMP tool sets. Benefits include improved functionality and improved reliability.

Background

      Water and slurry can build up on the top of the head weight, enabling bacteria to grow as the fluid becomes stagnant and increasing product defects. Additionally, the fluid coagulates and becomes difficult to remove during preventative maintenance. No conventional provisions are in place to prevent this issue.

      Previous findings of bacteria in the pocket area of the head weight may be associated to tool failures and bacteria on wafers.

Description

              The disclosed method includes three channels milled into the bottom of the head weight. The channels provide an evacuation path for process material that would otherwise build up or form a pool on top of the head weight during wafer processing. By evacuating the process material from the head weight, the process material is prevented from pooling, becoming stagnant, and promoting bacteria growth (see Figure 1).

              The key elements of the disclosed method include:

•             Channels milled between the mating surface of the head weight and the head

•             Centrifugal force created from normal head rotation forces any built up fluids to be evacuated from the top of the head weight

      The disclosed method prevents the growth of bacteria, which has the potential of being in...