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Method for EUV and VUV Light Generation

IP.com Disclosure Number: IPCOM000183060D
Original Publication Date: 2009-May-13
Included in the Prior Art Database: 2009-May-13
Document File: 1 page(s) / 20K

Publishing Venue

IBM

Abstract

Method for generation of broad spectrum of EUV and VUV (Extreme and Vacuum Ultra-Violet) light with relatively uniform and tunable spectral distribution. The method employs the Brehmsstrahlung principle.

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Method for EUV and VUV Light Generation

Generally available EUV and VUV light sources (arc lamps, lasers, plasma, synchrotrons, etc.) are not broad and uniform in their spectral output, or are altered to scan/illuminate a particular spectrum. While a narrow spectral purity is desirable for lithography, material characterization in the EUV and VUV spectrum is better served by broad and uniform spectral illumination. Broad and uniform spectral illumination will allow for faster, and more accurate characterization of the optical dispersion of materials (e.g., advanced semiconductor materials) in the EUV and VUV spectral ranges.

Basic physics of the Brehmsstrahlung principle: high speed electrons (or ions) are slowed by collision with an appropriate atomic target. The various changes in momentum are transferred to a broad spectrum of generated photons with energies up the initial electron energy. In addition, inner atomic shell electrons of the target can be excited and thus release photons of the (very) specific energy level transitions.

The Brehmsthralung principle employed in typical X-Ray tubes produces broad and relatively uniform spectral distributions in the X-Ray spectrum. I propose to reduce the typical X-Ray acceleration voltage, and to modify the anode targets in X-Ray tubes such that EUV and VUV light of a broad and realtively uniform spectral distribution is generated (lower energy electrons slowed by an appropria...