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Browse Prior Art Database

Electrical Fuse with Ru Liner

IP.com Disclosure Number: IPCOM000185169D
Original Publication Date: 2009-Jul-14
Included in the Prior Art Database: 2009-Jul-14
Document File: 5 page(s) / 129K

Publishing Venue

IBM

Abstract

In electrical fuses as the critical dimensions keep shrinking, the allowed programming voltage decreases. In order to maintain or improve the programming efficiency, a fuse structure with a weaker EM resistance is required. This article discloses a fuse structure created by O2 diffusion through a Ru liner at high temperature stress and containing an oxidized Cu interconnect surface. This oxidized Cu interconnect shows EM resistance degradation, which is benefical for highly efficient fuse application.

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Electrical Fuse with Ru Liner

Background

Electrically blowable fuses take advantage of the electromigration (EM) effect to open an electrical connection. A two-dimensional dog-bone shape fuse element, having a small cross-sectional area between large cathode and anode pads, is shown. Both top view, 8, and cross-sectional view, 9, are illustrated in the drawing below. During programming voids form at the center fuse element due to high current density and eventually create an electrically open circuit. It is also known that electromigration causes the conductive material to pile-up and form hillocks at the anode (most positive) end of the fuse element. Hillock formation is an undesirable effect that generally hasn't been exploited.

Typical electromigration failure mode
=> Cu/ dielectric interface is the fastest diffusion path => void nucleation sites

1

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The structure disclosed in this artilce to prevent this from occurring is illustrated below.

The Process Flow for Creating the Structure


1) Patterning in a dielectric (101) and hardmask (102) stack through conventional

lithography and reactive ion etching processes (FIG. 1).

2

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2) A Cu diffusion barrier material, TaN (201), is deposited on the patterned dielectr...