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Method for Preparing a Dielectric Material by Using a Mixture of Two or More Liquid Precursors

IP.com Disclosure Number: IPCOM000198572D
Publication Date: 2010-Aug-09
Document File: 1 page(s) / 18K

Publishing Venue

The IP.com Prior Art Database

Abstract

A method is disclosed for manufacturing dielectric materials with optimized properties while reducing cost of manufacturing. The method involves preparing a mixture of two or more liquid precursor. Subsequently, the mixture is supplied to a CVD tool for preparing dielectric materials.

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Method for Preparing a Dielectric Material by Using a Mixture of Two or More Liquid Precursors

Disclosed is a method for manufacturing dielectric materials with optimized properties while reducing cost of manufacturing.

In accordance with the method disclosed herein, two or more liquid precursors are mixed in a single liquid (mixture) in a container. The two or more liquid precursors are selected so as to meet different requirements. For example, one liquid is chosen to produce a best dielectric mechanical strength, and a second liquid is chosen to produce best plasma damage resistance. A mixture with such liquid precursors produces a material with good mechanical strength and good plasma damage resistance. The concentration of each liquid in the mixture can be adjusted according to the specific requirements for the material. Generally, the concentration of each liquid that is selected has been determined empirically based on measurements of material properties (mechanical strength and plasma damage resistance in the example given above).

Thereafter, the container is connected to a CVD tool, for example a plasma enhanced CVD (PECVD tool) using a chemical delivery system. The mixture is vaporized to form a vapor (gas) mixture containing the two or more liquid precursors. The PECVD tool performs plasma enhanced chemical vapor deposition. The PECVD tool is used according to methods known in the art. The mixture is processed using existing methods for preparing diele...