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High Aspect Ratio Structure Analysis

IP.com Disclosure Number: IPCOM000224098D
Publication Date: 2012-Dec-07

Publishing Venue

The IP.com Prior Art Database

Abstract

Conventional ion beam sample preparation causes artifacts when milling to expose a cross sections of high aspect ratio structures. The described process eliminates artifacts in high aspect ratio samples. An angled wall is milled in the sample. A protective layer is deposited on the angled wall. A vertical wall is then cut in the angled wall to expose the high aspect ratio structure at the desired depth. The expose cross section is then view by electron beam imaging.

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