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Spray Developer Wash 2 improvements and nozzle modification

IP.com Disclosure Number: IPCOM000228511D
Publication Date: 2013-Jun-14
Document File: 5 page(s) / 201K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is the modification on the Spray Developers tool rinsing mechanism which eliminates products defects (Brown stain contamination) due to crystalized KOH remains after developing process. This is due to uncontrollable water pressure fluctuation. The invention ensure that the concentration of the flow of water is centered consistenty on the product even there is a variation in the water pressure.

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Spray Developer Wash 2 improvements and nozzle modification

  At Photo RIE process, there were KOH remains due to different pressure of water for rinsing in the developer machines. During etching process, KOH remains will react to etching gas specifically on the corners and sides of the rail, which causes an effects to the sides and corners of the rail. Certain effects cannot be detected during Visual Inspection. During resist removal, certain effects made during etching process has a reaction on P6G causing brown stain contamination. See Figure 1.

Figure 1 - Process Flow of Photo RIE

Brown Stain Defect

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The invention is transferring the wash process from the original W2 to Dispense 2 and modifying the existing nozzle from ( - ) minus to round ( o ). The advantage is that even with a large variation on the water pressure, the concentration of the water will still be at the center of the product. See Figure 2.

The invention ensure that the Washing is centered of the product even there is a variation on the water pressure.

Figure 2.

Normal Improvement

Centered

D2

Centered

IDEALPRESSURE

IDEAL PRESURRE

W2

Not centered

D2

Centered

LOW PRESSURE

W2

D2

Not centered

Centered

HIGH PRESSURE

LOW PRESSURE

W2

Before & After the Improvement.

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BEFORE

AFTER

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Disclosed by Hitachi Corporation

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