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Method and System for Anticipating Circuit Designs at Early Technology Development Cycle

IP.com Disclosure Number: IPCOM000235789D
Publication Date: 2014-Mar-25
Document File: 2 page(s) / 26K

Publishing Venue

The IP.com Prior Art Database

Abstract

A method and system is disclosed for anticipating circuit designs at early technology development cycle. The method and system provides new corner models to predict circuit designs and their design variations corresponding to the technologies at their early stages of development.

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Method and System for Anticipating Circuit Designs at Early Technology Development Cycle

Disclosed is a method and system for anticipating circuit designs in early technology development cycle. The method and system provides new corner models to predict circuit designs and their design variations corresponding to the technologies at their early stages of development. The new corner models provide a blueprint of unknown circuit designs that are yet to be fabricated for the technologies that are at their early stage of development. In addition, the new corner models also verifies the performance of the circuit designs and checks if there is any weak link that can occur in the blue print provided.

In accordance with the method and system, the new corner models anticipate changes that are required in current circuit designs in relation with the technology developments. Elements required for future circuit designs in correspondence to the technology development are also identified. Elements for future circuit designs are such as but not limited to, MTS changes such as spacers, CD, overlay, resist aspect ratio, STI recess or STI material, halo angle and implant scheme, stress effect (Ge/B concentration), etc. Thereafter, a Technology Computer Aided Design (TCAD) environment is estimated
and generated in relation with the identified elements. Before initially estimating the TCAD environment, sensitivity in (n-1) of TCAD is recommended for generation of realistic TCAD generation. The method and system also determine process window of each MTS change and estimate 3-sigma parametric variations based on the sensitivity recommended.

In addition, the method and system also identifies other future elements such as but not limited to, structural MTS changes such as PC height,...