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Method and System for Performing Integrity Check on Experimental Data of an Optical Proximity Correction Model

IP.com Disclosure Number: IPCOM000235798D
Publication Date: 2014-Mar-25
Document File: 7 page(s) / 318K

Publishing Venue

The IP.com Prior Art Database

Abstract

A method and system is disclosed for performing integrity check on experimental data of an Optical Proximity Correction (OPC) model. The method and system performs the integrity check by performing statistical analysis, aerial image simulation and image inspection of the experimental data.

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Method and System for Performing Integrity Check on Experimental Data of an Optical Proximity Correction Model

Disclosed is a method and system for performing integrity check on experimental data of an Optical Proximity Correction (OPC) model.

The method and system filters data associated with generation of the OPC model. Here, the OPC model is generated using a sequence of steps that ensure better performance by using appropriate data set for generating the OPC model.

The method is performed in three steps for filtering the data. In the first step, a statistical analysis of the data is performed using a raw data obtained from a metrology engineer. Thereafter, repeated measurements are taken for a structure and thereafter examined. After examining the repeated measurements, value of statistical analysis such as, a range and a standard deviation of the repeated measurements are inspected for each data point. Additionally, inspection of suspicious data points is performed for one or more of removing, fixing and removing obvious bad data.

Fig. 1(a) and Fig. 1(b) illustrate the repeated measurements for the data and the structure of the data as an H bar respectively.

Figure 1(a)

Figure 1(b)

As shown in fig. 1(a), the measurement are 82.25, 74.39, 309.36, 83.48, 72.59, 78.62,
73.82, 84.89, wherein a measurement 309.48 is an incorrect measurement. Further, as shown in fig. 1(a), a standard deviation value and a range value are 81.7nm and

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236.8nm respectively before removing a corresponding data point and 2.6nm and
6.0nm after removing the corresponding data point.

After obtaining the repeated measurements, each individual measurement is compared against an average measurement. If an individual measurement is within an acceptable range such as, for instance, 5nm from the average then the individual measurement is retained, otherwise it is either flagged or removed.

Fig. 2(a) and Fig. 2(b) illustrate the individual measurement that measures 49nm and a corresponding structure respectively.

Figure 2(a)

Figure 2(b)

As shown in fig. 2(a) the measurements from left are 49.42, 49.88, 42.77, 43.15, 49.26,
52.67,...