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Automated Inline XPS Fleet Matching Optimization Method

IP.com Disclosure Number: IPCOM000236381D
Publication Date: 2014-Apr-23
Document File: 2 page(s) / 81K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is an alternative method for X-ray Photoelectron Spectroscopy (XPS) fleet matching in which a tool is matched to target using the un-adjusted Si signal as a reference. Because this is not tool-to-tool dependent, auto-re-calibration with Host based control is easily implemented to the fleet.

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Automated Inline XPS Fleet Matching Optimization Method

As X-ray Photoelectron Spectroscopy (XPS) applications grow, tool matching, such that output measurements remain uniform across a fleet, becomes critical. This is because regular use and daily maintenance checks cause slight signal variations from tool-to-tool. Thus, re-calibrating the tools to a standard needs to be done frequently for stable inline support.

Current vendors for inline XPS applications accomplish fleet matching by matching one tool to another through applying a gain/offset to each elemental spectra intensity until a desired target measurement is met. Therefore, this method is tool-to-tool dependent and uses absolute intensities which vary from tool to tool and drifts [per tool] overtime.

The novel contribution is an alternative method for XPS fleet matching in which a tool is matched to target using the un-adjusted Si signal as a reference. This reference intensity can be used to derive the correction factor needed to adjust each elemental spectra intensity. This method is tool independent and uses relative intensities. Because this is not tool-to-tool dependent, auto-re-calibration with Host based control
(i.e. Advanced Process Control (APC)) is easily implemented to the fleet.

XPS is used to derive the thickness and composition of a film stack. These calculations are based on the ratios of signal intensities outputted from each species in the stack. For example, measurement on an SiON film...