Publication Date: 2014-Jun-03
The IP.com Prior Art Database
AbstractA gas sensor comprises a set of one or more sensor cells (SC) and a substrate. Each SC of the set comprises a sensitive film built from a sensitive material covering an area of the substrate. One or more elevated structures are manufactured in or around said area for preventing the sensitive material to expand when being applied thereto.
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A gas sensor comprises a set of one or more sensor
cells (SC) and a substrate (1). Each sensor cell (SC) of the
set comprises a sensitive film (42) built from a sensitive ma-
terial (4) covering an area of the substrate (1). One or more
elevated structures (2) are manufactured in or around said ar-
ea for preventing the sensitive material (4) to expand when
being applied thereto.
The invention relates to a gas sensor and to a
method for manufacturing a gas sensor.
A gas sensor performs a detection of chemical sub-
stances or compounds which are also denoted as analytes con-
tained in a gas, or possibly in a fluid, supplied to the gas
sensor. In case multiple different analytes shall be detected
by a gas sensor, the gas sensor may comprise multiple sensor
cells with each sensor cell being designed for detecting one
or more of the subject analytes.
Disclosure of the Invention
It is desired to provide a way for manufacturing a
gas sensor that results in a high quality and reliable gas
sensor as well as such a high quality and reliable gas sensor.
The problem is solved by a gas sensor with a set of
one or more sensor cells. A sensor cell may be understood as
an entity of the gas sensor which may be read individually.
Each sensor cell of the set comprises a sensitive film built
from a sensitive material covering an area of the substrate
which area does not extend beyond a maximal admissible cover-
age area for the sensor cell that may be defined upfront. When
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bringing the sensitive material onto the substrate, it is de-
sired that the sensitive material does not extend outside such
maximal admissible coverage area designated for the sensitive
film. For this purpose, it is envisaged to provide one or more
elevated structures in said maximal admissible coverage area
for preventing the sensitive material to expand therefrom when
being applied thereto. It is noted that the one or more ele-
vated structures are arranged in maximal admissible coverage
area, i.e. their footprint is within maximal admissible cover-
age area. For this reason a top surface of the one or more el-
evated structures is likely to be covered by the sensitive ma-
terial. Subject to the view, an elevated structure shall also
include an indentation, for example an indentation in a layer
of the substrate. In one example, an elevated structure may
rather be perceived as an elevation in case the sensitive ma-
terial is deposited to a level of the substrate from which the
expansion inhibitors protrude. In another example, the elevat-
ed structure may rather be perceived as indentation in case
the sensitive material is deposited to a level of the sub-
strate that coincides with the top level of the elevations.
It is intended that an expansion of the sensitive
material at least stops at the outmost elevated structure/s,
and specifically at a falling edge thereof owed to surface
tension effects in the sensitive material when covering the
top surface ther...