Browse Prior Art Database

Photosensitive benzyloxypyridinium self assembled monolayer for directed assmebly of nanomaterials

IP.com Disclosure Number: IPCOM000237931D
Publication Date: 2014-Jul-22
Document File: 2 page(s) / 179K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method that achieves features as small as 10 nm using standard radiation tools such as deep ultra-violet (UV) light or electron beam radiation during large-scale Carbon Nanotube (CNT) integration. The novel component is to use a photosensitive benzyloxypyridinium self-assembled monolayer for the directed assembly of nanomaterials.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 57% of the total text.

Page 01 of 2

Photosensitive benzyloxypyridinium self assembled monolayer for directed assmebly of nanomaterials

Precise placement of Carbon Nanotubes (CNTs) on selected regions of the substrate is the central challenge of large-scale CNT integration. The most promising approach for placement of CNTs has been the deposition of CNTs from the solution onto the device substrate. One of the most successful approaches for selective placement of carbon nanotubes from solution uses a patterned surface of a silicon wafer with areas of silicon oxide and metal oxides (e.g., aluminum oxide or hafnium oxide). This approach enables a directed assembly of carbon nanotubes on small features (e.g., 100 nm). However, in order to fabricate realistic devices that can compete with existing silicon devices, selective placement of CNTs must be directed to much smaller features (e.g., 5-10 nm wide). Fabrication of patterned oxide surface with these small dimensions is not likely or perhaps impossible with present technologies.

The disclosed solution achieves features as small as 10 nm using standard radiation tools such as deep ultra-violet (UV) light or electron beam radiation.

With the novel approach, several derivatized benzyloxypyridinium salts with hydroxamic acid functionality for self-assembly on metal oxide surfaces are synthesized and used as photo-patternable self-assembled monolayer (SAM). UV exposure (e.g., 193, 240, or broadband) of the SAM though an optical mask generates patterns wit...