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CO2-Laser Based LPP System with Dose Control

IP.com Disclosure Number: IPCOM000238362D
Publication Date: 2014-Aug-20
Document File: 1 page(s) / 20K

Publishing Venue

The IP.com Prior Art Database

Related People

Seth Kalson: ATTORNEY

Abstract

Improve EUV source performance 3 loops of control: 1st embodiment: 10000Hz bandwidth control loop: pulse-width modulation of the CO2 laser pumping in response to the dose target and actual dose. 100Hz bandwidth control loop: a slope seeking algorithm adjusting the droplet stream position to maximize CE. 1Hz bandwidth control loop: adjusting laser beam position in response to control signal from scanner or from the internal plasma position sensor of the source module. 2nd embodiment: 10000Hz bandwidth control loop: pulse-width modulation of the CO2 laser pumping in response to the dose target and actual dose. 100Hz bandwidth control loop: a slope seeking algorithm adjusting the laser beam position to maximize CE. 1Hz bandwidth control loop: adjusting droplet stream position in response to control signal from scanner or from the internal plasma position sensor of the source module.

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