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Method of Supplying Gas

IP.com Disclosure Number: IPCOM000241385D
Publication Date: 2015-Apr-22
Document File: 1 page(s) / 85K

Publishing Venue

The IP.com Prior Art Database

Abstract

Problem: The existing method causes abnormal film thickness after idle time because vapor concentration becomes high as shown in fig.1-1. This problem should be avoided in ALD since supplies of all gases affect thickness. Solution: As shown in fig.1-2, release trapped vapor before deposition until gas concentration is stable.

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Problem:

The existing method causes abnormal film thickness after idle time because vapor concentration becomes high as shown in fig.1-1. This problem should be avoided in ALD since supplies of all gases affect thickness.

Solution:

As shown in fig.1-2, release trapped vapor before deposition until gas concentration is stable.