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Ellipsometric Measurement Spot Location and Stage Map Skew Detection

IP.com Disclosure Number: IPCOM000245349D
Publication Date: 2016-Mar-02
Document File: 2 page(s) / 60K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for ellipsometric measurement spot location and stage map skew detection.

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Title

Ellipsometric Measurement Spot Location and Stage Map Skew Detection

Abstract

Disclosed is a method for ellipsometric measurement spot location and stage map skew detection.

Problem

Determining exactly where on a wafer or stage a measurement is taking place is difficult because the measurement spot for the Spectroscopic Ellipsometry (SE) system is obscured by the pinhole. Multiple hardware and software alignments must be in place in order for the pinhole box to accurately aid measurement site placement. Precise spot placement is important for fleet matching and for ensuring measurement position accuracy. Stage mapping and skew are also important to a successful measurement.

Solution/Novel Contribution

The novel contribution is a method for ellipsometric measurement spot location and stage map skew detection.

The iterative measurement across the edge of the measurement pad in both the X and Y axis can be used to derive measurement spot location. The same test used across a fleet can determine where each tool is measuring relative to the fleet and/or specifications. The same test can reveal issues with the stage mapping across the wafer.

Using a specially built program and a spreadsheet (or other automated software for analysis), the method allows users to automatically identify tools within the fleet that are outside of specifications for spot placement and stage map skew. The results are quantitative. This test is fast, does not require vendor or maintenan...