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VINYL CONTAINING DISILACYCLOBUTANE STRUCTURAL ORGANOSILANE FOR NITROGEN DOPED SILICON DIELECTRIC LAYER BARRIER APPLICATION USING PECVD

IP.com Disclosure Number: IPCOM000250279D
Publication Date: 2017-Jun-21
Document File: 2 page(s) / 112K

Publishing Venue

The IP.com Prior Art Database

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Scope

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t.■ Disilacyclobutane structure is interesting to test for barrier layer in BEOL  Based on the experimental data Si-H needs in the molecule and no

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■ plus Si-vinyl substitute would be able to work ■ Ideal structure

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 1,3- divinyldisilacyclobutane  New structure based on Scifinder  Not available in chemical supplyer

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Air Liquide, world leader in gases for industry, health and the environment

ll CONTROLED Owner : Name - Function Th is

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2 00/00/2012 Doc title

Summery of this survey

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t.■ Film: Nitrogen doped SiC by PECVD : Room to file ■ Chemical (for filing the family of molecule)

 substitute has no oxygen

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w ith

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rio  1,3-dimethyl, 1,3-divilyl may go w/ PECVD process for nitrogen doped

film

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Air Liquide, world leader in gases for industry, health and the environment2013 Research & Development

ll CONTROLED Owner : Venkat Pallem – Group Manager T hi

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