Month of August 2017 - Page Number 9

Showing 81 - 90 of 233 from August 2017
Browse Prior Art Database
  1. 81.
    This document defines a data model for Large-Scale Measurement Platforms (LMAPs) [RFC7594]. The data model is defined using the YANG [RFC7950] data modeling language. It is based on the LMAP Information Model [RFC8193].
    IPCOM000250695D | Original Publication Date: 2017-Aug-01
  2. 82.
    A large-scale measurement platform is a collection of components that work in a coordinated fashion to perform measurements from a large number of vantage points. A typical use case is the execution of broadband measurements [RFC7536]. The main components of a large- scale measurement platform are the Measurement...
    IPCOM000250694D | Original Publication Date: 2017-Aug-01
  3. 83.
    IPCOM000250693D | 2017-Aug-22
  4. 84.
    IPCOM000250692D | 2017-Aug-21
  5. 85.
    One of the biggest risks with multistage fracturing systems is prematurely "screening out" into the wellbore. The excess proppant being pumped may pack off into the ID of the system and prevent pumping or physically block subsequent stages. This may require Coil Tubing intervention to remediate, abandonment of some...
    IPCOM000250691D | 2017-Aug-21
  6. 86.
    Disclosed is a method to simultaneously optimize 'p-p fin space', 'n-p fin space', 'TS overlap past fin', 'PC extension past fin' and other critical aspects of compact fin Field Effect Transistor (FET) circuit and static random access memory (SRAM) bitcell layout.
    IPCOM000250690D | 2017-Aug-21
  7. 87.
    Disclosed is a method to fabricate a Vertical Field Effect Transistor (VFET) structure with two Superlattices in the channel region, where each superlattice is independently controlled by a respective gate (dual gate device). The purpose is to circumvent the Fermi-Dirac statistic by harnessing a different...
    IPCOM000250689D | 2017-Aug-21
  8. 88.
    Disclosed is a method to create constriction regions in Source and Drain (S/D) extensions and enable tunneling behavior. The approach is to circumvent the Fermi-Dirac statistic by introducing tunnel barriers in the S/D regions through functionalization of inner spacers.
    IPCOM000250688D | 2017-Aug-21
  9. 89.
    Lithographic focus variability reduction requires a high level of effort, especially in a foundry business with a huge product variety and a small number of units. Known focus variability sources are, e.g. topography, non-flatness across reticle (i.e., reticle shape/lens) and across wafer, mask three-dimensional (3D)...
    IPCOM000250687D | 2017-Aug-21
  10. 90.
    Disclosed is a Remotely Operated Vehicle Supported Workover Control System.
    IPCOM000250686D | 2017-Aug-21