Browse Prior Art Database

Apparatus and process for deposition of hard carbon films (USH0000566) Disclosure Number: IPCOM000000562D
Original Publication Date: 1989-Jan-03
Included in the Prior Art Database: 2008-Apr-30

Publishing Venue

US Statutory Invention Registration (SIRs)

Related People

Nyaiesh, Ali R. Garwin, Edward L. [+details]
Other Related People:

Related Documents

Patent/Patent Application:
USH000566 US03916034 US04382100 US04563367 JP59-205470 [+more]


A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.