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Overlay disposition/control methodology for (1:4) nonconcentric field clustering in device manufacturing Disclosure Number: IPCOM000004674D
Publication Date: 2001-Mar-30

Publishing Venue

The Prior Art Database


Disclosed is a methodology to disposition production material and to control stepper alignment based on an overlay analysis tool when the current layer is printed in a different field size (4X) from the previous layer. Benefits of this methodology include improved disposition of production material, improved stepper control, and optimized sampling locations of raw measurement with a minimized uncertainty