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LAMP ANNEAL APPARATUS Disclosure Number: IPCOM000005638D
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2001-Oct-23

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Kazuo Toda


The lamp anneal apparatus of Fig. 1 is designed to provide high throughput annealing. The apparatus of Fig. 1 comprises a plurality of batch-type lamp anneal rooms. Wafers are input one by one to each of quartz chamber units and output therefrom after one revolution.