LAMP ANNEAL APPARATUS
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2001-Oct-23
The lamp anneal apparatus of Fig. 1 is designed to provide high throughput annealing. The apparatus of Fig. 1 comprises a plurality of batch-type lamp anneal rooms. Wafers are input one by one to each of quartz chamber units and output therefrom after one revolution.