CATHODE COUPLING ALL MODE PLASMA ETCHER
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2001-Oct-26
In PPE. plasma etching an R.F. supply is connected to one electrode and the wafer is placed on a second, grounded electrode. Anisotropic etching is very difficult to realize in this device. P.P.E. etching is best suited to isotropic etching with very little damage caused by ion etching.