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CATHODE COUPLING ALL MODE PLASMA ETCHER

IP.com Disclosure Number: IPCOM000005688D
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2001-Oct-26

Publishing Venue

Motorola

Related People

Authors:
Shinichi Nakajima

Abstract

In PPE. plasma etching an R.F. supply is connected to one electrode and the wafer is placed on a second, grounded electrode. Anisotropic etching is very difficult to realize in this device. P.P.E. etching is best suited to isotropic etching with very little damage caused by ion etching.