Dismiss
The IQ application will be unavailable on Sunday, November 24th, starting at 9:00am ET while we make system improvements. Access will be restored as quickly as possible.
Browse Prior Art Database

EDGE ROUGHNESS DETECTOR FOR SEMICONDUCTOR WAFERS

IP.com Disclosure Number: IPCOM000005720D
Original Publication Date: 1988-Oct-01
Included in the Prior Art Database: 2001-Oct-30

Publishing Venue

Motorola

Related People

Authors:
George Wayne Hawkins

Abstract

This device detects local rough spots in a semiconductor wafer edge by recording the noise created by rubbing the edge with a piece of plastic. Edge roughness on wafers frequently is due to flaws or cracks in the wafer edge. Such flaws reduce the strength of wafers. This detector system locates the flaws quickly, without damaging the wafer, and makes a permanent record of location and approximate magnitude.