IMPROVED MATCHED RESISTOR MANUFACTURE
Original Publication Date: 1988-Oct-01
Included in the Prior Art Database: 2001-Oct-31
In many cases integrated circuit devices require a pair of resistors, matched as closely as possible in value to meet the requirements of the circuit. This has frequently been attempted using doped polysilicon which is later photolithographically patterned to form the resistor structures of the appropriate physical geometry. The yield of pairs matched to the device requirements is often significantly less than 100% resulting in severe device yield losses. The goal of this study was to have resistor pairs matched to within one percent and overall have resistor values, chip to chip and wafer to wafer match within ten percent for the circuit to operate.