Browse Prior Art Database

LOCAL RESIST COAT PLANARIZATION OF ALIGNMENT TARGETS

IP.com Disclosure Number: IPCOM000005772D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2001-Nov-05

Publishing Venue

Motorola

Related People

Authors:
Whitson G. Waldo John Helbert

Abstract

Planarization structures in proximity to alignment targets act to minimize alignment variation caused by asymmetrical photoresist coating of alignment target features. Asymmetric resist pileups on target features are prevented by dummy border pattern placement, helping to stabilize alignment shifts caused by asymetric alignment light absorption, asymmetric signal reflection, and local variations in the resist's index of refraction.