RESONANT TUNNELING BIPOLAR TRANSISTOR (RBT) USING SI-GAP STRAINED QUANTUM WELLS IN SILICON
Original Publication Date: 1991-Apr-01
Included in the Prior Art Database: 2001-Nov-28
There is a need to reduce circuit complexity and component count in silicon circuits that utilize compound semiconductors (in this case gallium phosphide i.e. GaP, and silicon ie Si). In addition, quantum electronic device design in silicon based semiconductors must be able to be cost effective with respect to tooling of a production line, and perform adequately at high frequencies. 2. SOLUTION This resonant tunneling bipolar transistor (RBT) combines present day growth technology with existent RBT devices in the III-V compound material system. The device is shown schematically in Figure 1 and features a nominally thin (-1OOA) GaP pseudomorphic but single crystal barrier layer inter- spaced with nominally thin (-1OOA) Si layers. The thin GaP and Si layers could be placed between the emitter and the base regions as shown in Figure 1, or alternatively, only in the emitter, or only in the base. The GaP/Si heterojunction interface will now form a conduction band barrier to electrons of -0.4eV In the valence band, the GaP/Si interface will form a heterojunction of -0.8eV. Other than the thin GaP and Si layers, the device is basically a silicon bipolar junction transistor with an emitter, base and collector. The device would work with two GaP layers surrounding a Si layer, but is not limited to two.