Browse Prior Art Database

TECHNIQUE TO UNIQUELY MONITOR PHOTOLITHOGRAPHY DEFECTIVITY

IP.com Disclosure Number: IPCOM000006104D
Original Publication Date: 1991-Apr-01
Included in the Prior Art Database: 2001-Dec-04

Publishing Venue

Motorola

Related People

Authors:
Syd R. Wilson Sandeep Malhotra Donald F. Weston

Abstract

Defects due to particles tend to be the major source of yield loss in integrated circuits. The early detection and elimination of any source of particles can result in substantial increases in die yield. One area that is highly prone to this type of particle/defect related yield loss is the patterning of metal lines. This type of defect can cause opens or shorts in metal lines. In addition, any lithography related defect can impact many portions of the process since wafers are subjected to a lithography step more than any other step in the total flow.