Browse Prior Art Database

Method for Chrome Leakage Inspection Disclosure Number: IPCOM000006141D
Original Publication Date: 2001-Dec-06
Included in the Prior Art Database: 2001-Dec-06
Document File: 1 page(s) / 21K

Publishing Venue


Related People

John Maltabes: AUTHOR [+2]


Method for Chrome Leakage Inspection

This text was extracted from a Microsoft Word document.
This is the abbreviated version, containing approximately 54% of the total text.

Method for Chrome Leakage Inspection

John Maltabes, Karl Mautz, and Thorsten Schedel

Detecting defects on reticles can be expensive and time consuming.  This testing is becoming increasingly important on reticles designed for 193nm exposure technology.  It is very desirable to understand more about degradation effects of these reticles (defects that occur after prolonged use of the reticles).  Additionally, having an automated technique done with an in-line control method on a routine basis is needed. 

Reticles consist of patterns to be printed on wafers.  Various materials have been used for blocking unwanted radiation, however any material that has blocking properties for UV, deep UV and shorter wavelengths can be used.  Chrome is typically used on the reticles to mask areas so that no structures will be printed on positive resist processes.  Reticles are affected by chrome leakage effects.  If the density of the chrome is insufficient, light can go through the reticle and creates a defect or ghost pattern in the resist.  This may also be caused by variation of the reticle substrate material quality or by process variations during the reticle manufacturing.  These defects lead to a loss of device yield or lower performance.  In the future, the resist thickness will be further reduced and such defects caused by chrome leakage will be more detrimental that on processes using standard resist thicknesses.

This method was developed to test reticles for rapid determination of defects. It i...