Electrical Test Structure to Detect Dendrite Growth
Original Publication Date: 2002-Jan-07
Included in the Prior Art Database: 2002-Jan-07
This invention is an electrical test structure capable of detecting the presence of a dendritic growth at a via or metal level. Dendritic growth during Cu polish has been a chronic problem, and can only be detected optically. This structure is a metal comb that is normally open, but that can be shorted when a dendrite grows out from an nwell tie. It allows class probe to catch the problem. Many variations in the nwell design could be drawn, so the phenomenon of dendritic growth can be studied.