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Method for a premount pellicle inspection using reticle soft-defect inspection tools with applicability to a removable pellicle developed for 157-nm and EUV technology

IP.com Disclosure Number: IPCOM000006505D
Publication Date: 2002-Jan-09
Document File: 4 page(s) / 57K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a fixture design for premount pellicle inspection using reticle soft-defect inspection tools with applicability to removable pellicle developed for 157-nm and EUV technology. Benefits include accurate and objective size and location of the particle/defect on the pellicle and the use of a reticle inspection tool to inspect pellicles