INSITU-RESISTANCE HEATED PLASMA BOAT
Original Publication Date: 1992-Aug-01
Included in the Prior Art Database: 2002-Jan-15
This invention modiiies an ASM plasma plate boat standard ASM heating element/plasma system has a in such a way, that the wafer substrates can be heated to maximum temperature of 450°C. This modified Plasma temperature beyond the capability of the standard tube Boat, will be able to achieve up to 800°C (Maximum heating element. This elevated temperature is required temperature before N2 carrier gas will start nitridiig the where deposition stoichiometry of the films require high graphite plates). The standard graphite boat, manufac- atomic mobility ("Poly and/or Epitaxy" depositions). The tured by "ELECTROGRAPH" is shown in Figure 1.