IMPROVED AL TO CR/SI/N CONTACT RESISTANCE
Original Publication Date: 1992-Aug-01
Included in the Prior Art Database: 2002-Jan-17
For several years thin film resistors composed of chromium, silicon and nitrogen (CrlSi/N) have been used in many Motorola devices. These thin tihn CrlSilN resistors were originally developed to produce sheet resis- tivity, following high temperature anneal, and TCR val- ues compatible with the manufacture of these devices.