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PROCESS FOR HYBRID PHASE-SHIFTING MASK FABRICATION

IP.com Disclosure Number: IPCOM000006726D
Original Publication Date: 1993-Mar-01
Included in the Prior Art Database: 2002-Jan-25

Publishing Venue

Motorola

Related People

Authors:
Fourmun Lee Tom Zirkle

Abstract

The fabrication of state-of-the-art integrated circuits requires imaging of sub-O.5 micron features to increase both circuit density and device performance. The ability to print miniium feature size is often limited by the resolution of the available optical tool. Phase-shitbig pro- vides a way to extend the performance of both existing and new optical tools by improving resolution, depth of focus, exposure latitude, and resist sidewall profdes. To take advantage of the capabilities provided by phase- shifting, masks with well-defined, tightly controlled imag- ing characteristics must be produced.