Single Phase Shifting Mask Using Bright Field and Double Exposure
Publication Date: 2002-Apr-05
The IP.com Prior Art Database
A single phase shifting mask (PSM) can be used to form shapes on a wafer. This PSM uses chrome to define the shapes. The chrome is patterned on a light-transmitting section of the PSM having a first phase. Shifters of a second phase can be positioned relative to the shapes to provide sub-wavelength features.