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Single Phase Shifting Mask Using Bright Field and Double Exposure

IP.com Disclosure Number: IPCOM000007570D
Publication Date: 2002-Apr-05
Document File: 5 page(s) / 133K

Publishing Venue

The IP.com Prior Art Database

Abstract

A single phase shifting mask (PSM) can be used to form shapes on a wafer. This PSM uses chrome to define the shapes. The chrome is patterned on a light-transmitting section of the PSM having a first phase. Shifters of a second phase can be positioned relative to the shapes to provide sub-wavelength features.