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ABATEMENT OF HYDRIDE GASES FROM THE ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION PROCESSES

IP.com Disclosure Number: IPCOM000008053D
Original Publication Date: 1997-Mar-01
Included in the Prior Art Database: 2002-May-15
Document File: 1 page(s) / 69K

Publishing Venue

Motorola

Related People

Authors:
Dave Innmon Hsi-An Kwong Don Shams

Abstract

The apparatus and methodology presented here- in is applicable to all atmospheric pressure chemical vapor deposition equipment. In this article, the apparatus for improving the process operational sta- bility and exhaust abatement is discussed.