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Method for the use of an implant marker layer for the damascene etch end detector

IP.com Disclosure Number: IPCOM000008162D
Publication Date: 2002-May-22
Document File: 3 page(s) / 43K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for the use of an implant marker layer for the damascene etch end detector. Benefits include improved throughput and defect reduction.