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THE ELIMINATION OF AMMONIUM CHLORIDE DEPOSITION IN A LPCVD FORELINE

IP.com Disclosure Number: IPCOM000008181D
Original Publication Date: 1997-Jun-01
Included in the Prior Art Database: 2002-May-23

Publishing Venue

Motorola

Related People

Authors:
Ivan Field Peter Donald

Abstract

In a LPCVD system a problem exists due to deposition of the by-product Ammonium Chloride on the unheated foreline surface. Pumping and vent- ing the foreline caused the deposit to backstream into the furnace tube, resulting in high infilm particle counts affecting uptime and MTBF.